SUPLaDUO is an epoch-making vacuum deposition process (ion plating method, or plasma assisting ionization evaporation method) in which Chugai Ro's variegated practical plasma control technology accomplished through long years' development are united with its long accumulated comprehensive vacuum and thermal technology.

SUPLaDUO is equipped with pressure gradient type hollow cathode plasma gun which performs low voltage and high electrical current plasma with high ionization ratio.Magnetic field controlling technology based on Chugai Ro's original development controls the plasma.
Good quality film is created in lower substrate temperature,high deposition speed and high reactivity.At the same time,splash is restrained. Itswidespread application software and hardware are enriched and made more practical.

・It can perform depositions of ;

• low resistance transparent electrical conductivity film(ITO) in low substrate temperature and in high deposition speed.
• fine MgO film superior in spatter-resistance in as 3-4 times as high deposition speed as before.
• Film superior in adhesion, duration, lubricity and hardness in high deposition.
• Combination film and/or multi layer film of OXide,Nitride and etc.

・Basic system pattern

• Batch Type
• Batch Inter-Back Type
• In-Line Type
• Continuous Inter-Back Type
• Roll to Roll Type

Chugai Ro provides optimum SUPLaDUO systems in a wide range, including those for development and mass-production use, to satisfy a variety of applications.
It is necessary to incorporate the reflective electronic feedback electrode system for the stable mass-production of film as insulation material.